Argon Purification Equipment
Product Details
I. Methods for Argon Purification:
The first type
Direct deoxidation: This method involves reacting active metals or catalysts with the oxygen in argon gas to eliminate the oxygen content, thereby achieving deoxidation. Subsequently, molecular sieves are used to absorb moisture from the argon gas, reducing its water content to less than 1 ppm.
The second type
It employs an getter material. At a specific temperature, the getter can absorb gases such as nitrogen, hydrogen, oxygen, carbon monoxide, carbon dioxide, and methane. After undergoing this absorption process, the purity of argon can reach 6 nines. The high‑purity gases produced using this process are suitable for a wide range of instrumentation and metering applications.
The first method requires a small equipment investment, while the second method offers high purification purity but involves a relatively larger investment.
2. Technical Parameters:
1. Processing Gas Capacity: 5–3000 Nm³/h (non-standard equipment can be custom‑ordered according to user requirements)
2. Raw Gas Requirements: Liquid argon or high‑quality pipeline argon can both be used.
3. Working pressure is adjustable from 0.2 to 1.6 MPa.
4. (Argon Purifier) Purification Efficiency: After purification, the purity meets and exceeds the 99.9996% requirement specified in GB/T4842-2006.
Gas Purity (%) H2 (ppm) O2 (ppm) N (ppm) CO2 (ppm) CH4 (ppm) Dew Point (H2O)
Pure Argon 99.9996 ≤0.5 ≤0.5 ≤0.5 ≤0.5 ≤0.5 ≤1.5
3. Equipment Features:
1. The purifier is characterized by its excellent adsorption capacity and high absorption of impurity gases, with a purity level exceeding 99.99999%.
2. The purifier employs a special structure and loading method, with a reasonably designed flow rate and uniform airflow distribution.
3. All pipelines are precision‑drawn tubes meeting BA grade standards, both internally and externally. Imported compression‑type ball valves are used to completely eliminate secondary contamination of the gas as it flows through the piping system.
4. Dual‑stage structure: After startup, one set operates while the other undergoes regeneration and remains on standby. Moreover, the RZ‑YA‑C series of semi‑automatic purification units handle both operation and regeneration automatically, enabling continuous gas supply—meaning a single unit can effectively replace two single‑stage units.
5. Functional Description of the RZ-YA-D Series Fully Automatic Argon Purification Unit Manufactured by Our Company:
A. It features fully automatic operation and is simple to use: starting and stopping the machine only requires pressing two buttons—no valves need to be turned. All these tasks are handled automatically by the PLC program. This also eliminates gas impurities caused by human error in manual and semi‑automatic models, resulting in more stable pure gas quality.
B. The text display controller uses a joint‑venture brand—Kunluntongtai’s 7‑inch LCD touch screen—which provides real‑time simulation of workflow status and displays various parameters, while allowing for the adjustment of each parameter at any time, greatly simplifying operations for staff.
C. An online analyzer can be equipped according to user needs for real‑time, in‑line monitoring.
4. Application Areas:
This series of argon purification units is used in high‑purity gas filling stations, welding operations, stainless steel manufacturing, and metallurgy. It is also employed in semiconductor manufacturing processes such as chemical vapor deposition, crystal growth, thermal oxidation, epitaxy, diffusion, polycrystalline silicon production, tungsten deposition, ion implantation, carrier transport, and sintering—where argon serves as a protective gas for the production of both monocrystalline and polycrystalline silicon.
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