Oxygen purification equipment
Summary:
Category:
Gas Purification
Tag:
Product Details
I. Overview
The YYC series oxygen purification unit employs a specially formulated catalyst and uses industrial oxygen as the feed gas. Through a catalytic oxidation process, it removes H2, CO, and hydrocarbons; after passing through a cooling system and a gas–water separator, H2O and CO2 are removed via adsorption and drying, with two towers operating in alternating cycles of operation and regeneration. This process is unable to remove inert gas impurities such as nitrogen and argon from the oxygen.
Chemical equation: O₂ (AO₂) + H₂, CO, CH₄ → (AO) + H₂O + CO₂
2. Technical Parameters:
1. Processing Gas Capacity: 1–2000 Nm³/h (non-standard equipment can be custom‑ordered according to user requirements)
2. Raw Gas Requirements: Industrial Oxygen
3. Working pressure is adjustable from 0.2 to 3 MPa.
4. (Oxygen Purification Unit) Purification Efficiency: After purification, the purity meets and exceeds the 99.9996% requirement specified in GB/T14599-2008.
Gas Purity (%) H2 (ppm) N (ppm) CO2 (ppm) CH4 (ppm) Dew Point (H2O)
High‑purity oxygen: 99.9996 ≤0.5 Not detected ≤0.5 ≤0.5 ≤1.5
3. Equipment Features:
1. The purifier features a special structural design and loading method, with a reasonably optimized flow rate and evenly distributed airflow. The catalyst in this purifier boasts high activity, while the adsorbent offers a large capacity, resulting in lower operating costs.
2. All BA‑grade inner and outer precision‑drawn tubing lines are used, equipped with imported ferrule‑type ball valves, effectively eliminating any secondary contamination of the gas as it flows through the piping system.
3. Dual‑system design: After startup, one set operates while the other undergoes regeneration and remains on standby. Moreover, the RZ‑YYC series of semi‑automatic purification units handle both operation and regeneration automatically, enabling continuous gas supply—meaning a single unit can effectively replace two single‑system units. Customized fully automatic operation modes are also available based on customer requirements.
4. Strong resistance to fluctuations: The system has low requirements for the feedstock oxygen and can tolerate impurity levels as high as 1000 ppm. Therefore, even when users opt for inexpensive industrial oxygen as their gas source, they can still meet the required specifications.
5. Depending on the customer’s feed gas specifications and product gas requirements, different processes can be employed to meet their needs.
4. Application Areas:
This series of oxygen purification units is suitable for major production departments such as semiconductors, optical fibers, transistors, and cathode-ray tubes that require large quantities of high‑purity oxygen.
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